STORAGE OF CALIBRATION WAFER STANDARDS PRODUCED WITH PARTICLE SIZES < 100 NM.
What is the best method to store Calibration Wafer Standards produced with particle sizes of less than 100 nm? Cleanrooms normally operate at 70F, about 21C, and typically around 40% humidity. When using a Calibration Wafer Standard to calibrate your Wafer Inspections Systems in the lab, the particle sizes deposited on the wafer standard under […]
Silica Particle Wafer Standards, Silica Particle Size Standards

Silica Particle Size Standards In today’s semiconductor metrology labs, the wafer inspection tools, use high powered lasers to scan 200 mm and 300 mm silicon wafers to detect surface particles down to < 30 nanometers. When calibrating high laser power scanning systems, the size calibration is extremely important, in order to detect at 30 nm; […]
STORAGE OF CALIBRATION WAFER STANDARDS PRODUCED WITH PARTICLE SIZES < 100 NM.
What is the best method to store Calibration Wafer Standards produced with particle sizes of less than 100 nm? Cleanrooms normally operate at 70F, about 21C, and typically around 40% humidity. When using a Calibration Wafer Standard to calibrate your Wafer Inspections Systems in the lab, the particle sizes deposited on the wafer standard under […]
Silica Particle Wafer Standards, Silica Particle Size Standards

[et_pb_section fb_built=”1″ admin_label=”section” _builder_version=”4.16″ global_colors_info=”{}”][et_pb_row admin_label=”row” _builder_version=”4.16″ background_size=”initial” background_position=”top_left” background_repeat=”repeat” global_colors_info=”{}”][et_pb_column type=”4_4″ _builder_version=”4.16″ custom_padding=”|||” global_colors_info=”{}” custom_padding__hover=”|||”][et_pb_text admin_label=”Text” _builder_version=”4.16″ background_size=”initial” background_position=”top_left” background_repeat=”repeat” global_colors_info=”{}”] Silica Particle Size Standards In today’s semiconductor metrology labs, the wafer inspection tools, use high powered lasers to scan 200 mm and 300 mm silicon wafers to detect surface particles down to < […]